NESSY – EUV sputter machine
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NESSY II is a second generation magnetron sputter system mainly used for the production of EUV extreme ultraviolet mirrors under UHV conditions. It is designed for mass production as well as the R&D of new products. The machine can be equipped with up to 6 different rectangular sputter cathodes and uses materials like Mo, Si and diffusion barrier layers. As a result, a complete coating stack can be performed in one cycle. Flat main and sub-rotation, as well as curved substrates, allow the coating to have an extremely high layer thickness uniformity or rotationally symmetric gradient layers.
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Fields of applications
- EUV coating for collector optics
- synchrotrons optics
- x-ray astronomy
- soft x-ray lasers
- plasma physics
Features & Benefits:
- Single substrate load lock for automatically loading and unloading which prevents the vacuum from breaking.
- UHV –sputtering system with base pressure
< 9 * 10-9 mbar for excellent film quality.
- Low pressure sputtering with up to 6 special developed magnetron sputter cathodes
PK 600 x 125 mm.
- Suited for various materials, including Mo, Si, diffusion barrier layers and capping layers
- Extremely good layer thickness uniformity is achieved as a result of planetary based substrate tables, with main drive and sub rotation that have capabilities of programming speed profiles.
- Adjustable sputter distance for different substrate height; maximum substrate height is 240mm (substrate incl. substrate carrier).
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Questions, inquiries, comments?
Get in touch with us at
Telephone: +49 6023 500-463 and -467
E-mail: sales.precision@leyboldoptics.com
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Technical Data:
| System |
NESSY II |
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| Coating technology |
DC and DC pulsed sputtering. For other applications RF sputtering can be installed (option) |
| Coating material |
Mo, Si, Cr, Sc,… and different materials for diffusion barrier layers and capping layers
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| Capacity Standard |
one substrate, Ø 200mm, max weight 30kg (substrate incl. carrier)
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| Capacity Optional |
one substrate, up to Ø 660mm, max weight 100kg (substrate incl. carrier) – for heavy substrates the spin drive speed is limited
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| Sputter Source |
up to 6 PK 600mm x 125mm
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| Layer Monitoring |
Time Control |
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| System length [mm] |
7110 |
| System width [mm] |
5780 |
| System height [mm] |
2900 |
| System weight [kg] |
9700 |
| System weight and dimensions can be changed accordant to individual specifications |
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| Electrical power [kVA] |
46 |
| Line Voltage |
400 VAC, 50/60 Hz
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