HELIOS family – Sputter machine for top grade products
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| The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Unsurpassed optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Ultimate precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements. | ||||||||||||||||||||||||||||||||||||||||||||
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PARMS Process TechnologyThe deposition of metal oxides with high and low refractive indices with PARMS (Plasma Assisted Magnetron Sputtering) is achieved by combining dynamic reactive mid-frequency (MF), dual magnetron sputtering with partial pressure control, and a reactive assist process with the RF plasma source.During each rotation, a thin sub-stoichiometric oxide layer is deposited by the selected dual magnetron and transferred to a non-absorbing oxide layer while passing the oxygen plasma of the RF source. Extremely Stable ProductionDirect on-substrate optical monitoring is performed on an intermittent mode using an arbitrarily selected substrate position on the rotating turntable. As a consequence, optical designs can be directly and quickly transferred into production. This makes the HELIOS extremely well suited for high precision production as well as rapid prototyping. Co-SputteringCo-sputtering enables the realization of any refractive index between the installed high and low indices. Additionally, easier designs can be made for a number of applications, such as polarizing beam splitter, by using one or more optimal intermediate indices.
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Telephone: +49 6023 500-463 and -467 |
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