EUV and DUV CoatingsTo achieve higher resolution and smaller structures, and thereby also a higher packing density of transistors and other units on a chip, current research and development focus on the use of X-rays with wavelength of 13.4 nm, i.e., in the EUV–range. The necessary components for the photolithography units are collector mirrors which are able to achieve high reflectance at 13.4 nm, have a long life time in operation and can withstand temperatures over 600°C. The materials necessary for this kind of coatings are Mo and Si for mirror coatings. Reflectance values of more then 65% at 13.4 nm have been achieved already. The layer systems consist of more than 100 layers with individual layer thicknesses of few nanometres. This requires a high precision, high stability and repeatability of the coating process. Leybold Optics succeeds in developing and to introducing this unique sputtering system already to the market, prepared for the next generation EUV – Lithography, the Nessy. Other coating applications for the Nessy are X–ray coatings especially for measurement devices using X-rays. The state of the art in photolithography is to use light in DUV range at 193 nm. Leybold Optics has developed a specially designed coating system for DUV–applications, the SYRUSpro DUV. For laser mirror application we have developed an adapted process with oxides to achieve a high reflection value of up to 98% with the aid of the APSpro – plasma source. These coatings are dense and shift free and exhibit all the advantages of the coatings with APSpro. Coatings with fluorides in SYRUSpro DUV shows low losses and can be especially applied for AR – coatings for lenses used in photolithography devices, as well for high reflection mirror coatings with reflectivity of up to 99%. |
||||
Machines |
||||
NESSY Sputter system for the production of EUV extreme ultraviolet mirrors under UHV conditions more... |
SYRUSpro family Evaporation batch coating systems for any requirements in the field of precision optics more... |
|
||
