Leybold Optics GmbH

Phoebus - The highly flexible tool for uninterrupted Silicon Thin Film amorphous / microcrystalline (a-Si/µc-Si) tandem solar cell production

With a unique inline-cluster design the PHOEBUS concept is the only one that is especially adapted and engineered for Silicon thin-film applications. In such PHOEBUS customers achieve maximum levels on productivity and quality during daily production. This objective is achieved due to an exceptional design of the process chambers, which guarantees not only highest deposition rates within the PV market, but impressively uniform and reproducible layer characteristics in parallel.

Through automated and individual cleaning of every process chamber by means of greenhouse friendly gas Flour (F2) a maximum in productivity is achieved.

As each process chamber is connected to an evacuated transfer tunnel, the substrate is always kept under vacuum even during carrier-free transfer from one chamber to another. Additionally a newly developed heating system warrants that substrates are always kept at process temperature. Therefore drifts in temperature are excluded and process stability increased to its maximum.

 
Phoebus PECVD System
 
The standard configuration of a PHOEBUS system consists of 15 process chambers with individual pumping stacks for every chamber, to avoid any kind of cross-contamination between adjacent chambers. Furthermore every process chamber can be separated from the transfer tunnel meanwhile all other chambers are kept in normal operation mode. In such the production flow neither is negatively impacted in terms of quality performance nor will be interrupted.

Of course but only on a PHOEBUS system every single process chamber can be adapted to our customers needs for parallel deposition of any kind of layer characteristics like: amorphous (a-Si), microcrystalline (µc-Si), intrinsic, p-doping, n- doping, interreflective (IR) layers

Based on above mentioned conceptual, technological and performance figures, PHOEBUS customers can be sure, that their production capabilities will not only be extremely economical and on highest technological level by today, but is dedicated to meet future market demands, too.

Exceptional layer qualities

Most difficult for manufacturing a-Si/µc-Si tandem cells is to achieve highly uniform and reproducible microcrystalline layer for the bottom cell formation.

The picture shows a typical result in absolute percentage of the crystallinity measured on a Raman spectrograph of a 1’100 x 1’400 mm substrate coated by a PHOEBUS production tool.

In this case an excellent value for the statistical
standard deviation is achieved of:

                            Sigma = 1.73%

Regarding uniformity standard deviation levels less than 2.4% have already been achieved.


Multi-purpose tool

PHOEBUS equipment can be used for the formation
single junction, tandem junction or even triple junction cells.

Therefore this machine can be e.g. perfectly integrated in already existing a-Si manufacturing surroundings for a capacity and module performance upgrade from single junction (a-Si) to tandem junction (a-Si/µc-Si) cells and modules. In such a case the necessary second and so called bottom cell is applied on existing amorphous cells manufactured on already existing equipment. In case the existing equipment is stopped, the PHOEBUS can take over this manufacturing step, too, for the deposition of the entire tandem cell.


Features:

  • Unique modular design features the
    manufacturing of:
    • single junction cells (a-Si or µc-Si)
    • tandem junction cells (a-Si/µc-Si or
      a-Si/a-Si)
    • multiple junction cells
      (triple junction cells,…)
  • Highest productivity and uptime
  • Unique carrier-free concept
  • Uninterrupted vacuum during entire process
  • Stable substrate temperature during processing and transportation
  • Easy access to each single reactor for
    maintenance purposes
  • Each single reactor can be separated from the system even during operation of the rest entire system (e.g. for maintenance purposes)
  • Greenhouse friendly and automated in-situ cleaning of process chambers by means of Fluor (F2) integrated in the system’s processing  scheme 
  • Cleaning after several deposition cycles reducing total cleaning time
  • No mechanical cleaning needed
  • Excellent gas separation between the individual process chambers avoiding any cross contamination between process chambers
  • Extraordinary uniform layer deposition for amorphous (a-Si) and microcrystalline (µc-Si) layers 
  • Substrate handling extensively automated throughout entire system
  • Ease of expansion and adaptation to key up with technology changes
  • Excellent maintenance and service accessibility
  • Robust design to achieve superior equipment life time
  • Large variety of diagnostic functions for machine status
  • Service, PLC updates and other controls via remote access
  • Availability of Lab tool for 300 x 300 mm substrate sizes
 

Raman spectrograph

 

Phoebus

Questions, inquiries, comments?
Get in touch with us at

Telephone: +49 351 86695-112 and -83
E-mail: sales.photovoltaics@leyboldoptics.com


 
Phoebus

Technical Data:

  • Dimensions (incl. maintenance areas): 32.2 x 13.5 x 4.8 m (LxWxH)
  • Min. room height: 6 m
  • No clean room class required
  • Size of rectangular shaped glasses:
    • 1’300 x 1’100 mm (Gen5) or    
    • 1’400 x 1’100 mm (MHI standard)
  • Substrate thickness: 2 … 5 mm
  • 15 individual process chambers connected to one transfer tunnel
  • Vertical (95°) overhead orientation of the substrate
    • avoids particle contamination on substrate surfaces
    • no defects and shunts caused by deposition process
  • Only one substrate within one process chamber
  • Parallel, separated and individual processing of 15 substrates
  • Process setting via recipe handling system
  • Data tracking for every substrate
  • Data exchange to MES system
  • Loading / unloading area consisting of
    • one load lock
    • one exit lock
    • two adjacent conveyor modules
    • one highly efficient external cooling station
  • 6-achis clean-room suitable robot for external substrate handling
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