Silicon Thin FilmA silicon thin film cell uses amorphous (a-Si or a-Si:H) or micro-crystalline (µc-Si or µc-Si:H) silicon. Silicon layer systems are commonly generated by chemical vapor deposition, typically plasma-enhanced (PECVD), with Silane and Hydrogen gas as source materials. The Silicon is deposited on glass, plastic or metal which has been pre-coated with a layer of transparent conducting oxide (TCO).
|
||||
Machines |
||||
Phoebus
PECVD production tool made for deposition of Silicon layers for thin film PV applications like a-Si/µc-Si (tandem) cells or µc-Si (micro-crystalline) cells on already existing a-Si cells. more... |
||||
Phoebus Lab Tool
PECVD tool available for R&D and process development purposes of Silicon layers for thin film PV applications on 300 x 300 mm substrate dimensions. more... |
||||
Vertical sputter
Vertical multi-chamber sputter inline systems for photovoltaic applications. more... |
||||
Pegasus
High-throughput, fast cycle vertical inline sputter system for glass substrates more... |
||||
Horizontal sputter
Horizontal multi-chamber sputter inline systems for photovoltaic applications. more... |
